Thuis
Producten
Over ons
Fabriekstocht
Kwaliteitscontrole
Neem contact met ons op
Vraag een offerte aan
Nieuws
Baidu
Baoji Luox Quality Metals Co., Ltd.
Thuis ProductenTitanium Sputterend Doel

High-purity and high-density titanium sputtering target Titanium thin film material

China Baoji Luox Quality Metals Co., Ltd. certificaten
Ik ben online Chatten Nu

High-purity and high-density titanium sputtering target Titanium thin film material

High-purity and high-density titanium sputtering target Titanium thin film material
High-purity and high-density titanium sputtering target Titanium thin film material High-purity and high-density titanium sputtering target Titanium thin film material

Grote Afbeelding :  High-purity and high-density titanium sputtering target Titanium thin film material

Productdetails:
Plaats van herkomst: China
Merknaam: N/M
Certificering: ISO9001:2015 certification
Modelnummer: Cdx-tb-2021004
Document: Productenbrochure PDF
Betalen & Verzenden Algemene voorwaarden:
Min. bestelaantal: 5 kg
Prijs: onderhandelbaar
Verpakking Details: triplexgeval
Levertijd: 5-35 werkdagen
Levering vermogen: 50000KG/month
Gedetailleerde productomschrijving
sleutelwoorden: Titanium sputterend doel naam: De plaat van het titaniumdoel
Sollicitatie: Industrie, Chemisch product, Ruimte, Navigatie, Vacuümdeklaag Techniek: Gesmeed, CNC-bewerking, warmgewalst, gesmeed en CNC-gefreesd
Rang: Gr1 Dichtheid: 4.51g/cm3

Titanium target

High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)

Titanium target plate

High-purity and high-density titanium sputtering target
Titanium target Titanium sputtering target material Used for liquid crystal display, laser memory, electronic controller, sputtering thin film material, semiconductor integrated circuit, solar photovoltaic, recording medium, flat display and surface coating of workpiece
Titanium target Titanium sputtering target material Used for liquid crystal display, laser memory, electronic controller,

sputtering thin film material
Titanium target Titanium sputtering target is used for semiconductor integrated circuit,

solar photovoltaic, recording medium, flat display and workpiece surface coating

Titanium target plate
Titanium sputtering target
Titanium target tube

Material:  Pure titanium Gr. 1
Application:

Titanium target Titanium sputtering target material Used for liquid crystal display, electronic controller, sputtering thin film material,

semiconductor integrated circuit,

solar photovoltaic,

recording medium,

flat display and surface coating of workpiece

Purity:  99.96% - 99.99%
Custom made:  support

Tolerance:

 

 +/-0.05mm

 

Shape:  round target, rectangular target

 

Usually we will provide a quality inspection report like this with the goods,

which shows the chemical composition and physical properties

 

Terms of trade EXW FOB CIF
Payment terms T/T , L/C
packing Plastic paper inside , plywood case outside
Delivery time In general,the delivery time is 5 days to 35 days. Please confirm the exact delivery time with us as different products and different quantity need different delivery time.
MOQ Small order quantity is acceptable

 

High-purity and high-density titanium sputtering target Titanium thin film material 0

High-purity and high-density titanium sputtering target Titanium thin film material 1

Q: Why choose us?

A1: We have 14 years experience for titanium products making.

A2: sample order is acceptable.

A3: lower price, good quality and short delivery time.

A4:The quotation can be make within 24 hours.

A5: ISO9001:2015 certification

A6: Give us drawing, make your drawings and ideas become a reality!

A7: Provide third-party quality inspection reports.

 

 

 

Contactgegevens
Baoji Luox Quality Metals Co., Ltd.

Contactpersoon: Ms. Grace

Tel.: +8613911115555

Fax: 86-0755-11111111

Direct Stuur uw aanvraag naar ons (0 / 3000)

Andere Producten